14 Jul 06Semiconductor International Editor's Choice Award presented to Cascade Microtech for eVue™ digital imaging system

Beaverton, Ore. – July 14, 2006 – In developing a product that is truly making a difference in semiconductor manufacturing, Cascade Microtech received the prestigious Editors’ Choice Best Product Award, presented annually by Semiconductor International magazine, for the eVue^TM  digital imaging system. In a ceremony held on July 12 in San Francisco, Semiconductor International announced 20 winners whose products are making a difference in semiconductor manufacturing.

 “Advances in semiconductor technology are only possible because of the kinds of products being honored in this year’s Editors’ Choice Best Product Awards program,” says Pete Singer, Editor-in-Chief of Semiconductor International. “Chipmakers rely on these products to create electronics that are smarter, smaller, faster, less expensive and more reliable. We congratulate the people and the companies that have had the insight and fortitude to bring these products to the market.”

“The eVue digital imaging system radically improves upon traditional methods of wafer navigation, test set-up and control of probe contact accuracy for engineering measurements,” said John Pence, vice president and general manager, Engineering Products Division, Cascade Microtech. “With its one-of-a-kind integration of microscopy, digital imaging, and software user interface, eVue is the first system to allow semiconductor R&D engineers to quickly set up, navigate, profile and test wafers in one complete system.”

Semiconductor International, published by Reed Business Information and a part of Reed Elsevier’s global array of information products, is the leading technical publication reaching and covering the global semiconductor manufacturing industry. SI boasts the industry’s most experienced full-time technical editorial team, and has the largest circulation to semiconductor manufacturers of any industry publication. Additional information about SI and its many products and activities are available at www.semiconductor.net.

About Cascade Microtech’s eVueTM  digital imaging system

Smaller integrated circuit dimensions, new materials and larger wafers all contribute to the challenges faced by semiconductor manufacturers in the design, production and testing of today’s leading-edge chips.  To address those challenges, Cascade Microtech developed the eVue digital imaging system to enable dramatic productivity gains in semiconductor wafer navigation and testing. Designed primarily for engineers doing process development or device characterization and modeling, using the eVue digital imaging system can easily save two to three hours a day that is currently wasted on inefficient semiconductor navigation and test data collection issues.

Optimized for on-wafer test with Cascade Microtech’s wafer probing stations, eVue allows users to navigate, observe, and measure leading-edge devices much quicker and more effectively than with a conventional microscope. It combines new wafer probe navigation tools and advanced video processing with next-generation digital microscope technology.