European Microwave Week (EuMW)

Manchester Central, Manchester, UK

October 11, 2011 - October 13, 2011

Booth: 401B in Agilent Avenue

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October 10, Monday, 09:50-10:10

EuMIC 03-5: Designing On-Wafer Calibration Standards for Advanced High-Speed BiCMOS Technology
This paper presents design methodology of on-wafer calibration standards for BiCMOS processes. We discuss such topics as layout optimization of distributed and lumped standards, measurement and verification of electrical characteristics along with the definition of the on-wafer calibration reference impedance and measurement reference plane. Also, we present calibration verification results and key characteristics of an active DUT implemented in Si/SiGe:C ST Microelectronics’ BiCMOS9MW process technology featured 130 nm emitter width and a self-aligned double-polysilicon architecture with a selective epitaxial growth (SEG) of the base.

October 13, Thursday, 09:10-09:30

EuMC29-3: Microwave Probe Comparison Using an Interface Inductance Benchmark
In this work we compare the performance of a number of microwave Ground-Signal-Ground probe designs for the case of a test device that causes asymmetric ground currents. An interface inductance benchmark first proposed is used to quantify the different behavior of three different probe designs. A simple one-port inductor measurement shows the impact on measurement accuracy for the various probe designs and serves to demonstrate the accuracy of the interface inductance model proposed.

Agilent Technologies Workshops (Central Room 3)

October 13, Thursday, 13:30 - 14:45

RF Multi-contact RF Measurement Solutions
With a growing demand for consumer products working in RF, Microwave and mm-wave frequency ranges, many circuits now need multiple DC and RF test connections with frequencies up to 110GHz. Applications such as wireless HDMI and automotive collision avoidance radar are examples of demanding applications that traditional multicontact probes cannot address. This session introduces new probe technologies and calibration techniques that are now available to address these needs.

October 13, Thursday, 15:00 - 16:15

Choosing the Optimal Calibration Strategy for Wafer-Level S-Parameter Measurements
This topic will cover most popular two-port calibration methods. Special attention will be given to the common misconceptions and errors. We also discuss specifics of calibrating with customized set of standards, as well as the impact of the calibration standard design and measurement environment.